High Oxygen Sensitivity of TiO<sub>2</sub> Thin Films Deposited by ALD

High Oxygen Sensitivity of TiO<sub>2</sub> Thin Films Deposited by ALD

The gas sensitivity and structural properties of TiO<sub>2</sub> thin films deposited by plasma-enhanced atomic layer deposition (ALD) were examined in detail. The TiO<sub>2</sub> thin films are deposited using Tetrakis(dimethylamido)titanium(IV) and oxygen plasma at 300 °C o...

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Bibliographic Details
Main Authors: Aleksei V. Almaev, Nikita N. Yakovlev, Dmitry A. Almaev, Maksim G. Verkholetov, Grigory A. Rudakov, Kristina I. Litvinova
Format: Article
Language:English
Published: MDPI AG 2023-09-01
Series:Micromachines
Subjects:
TiO<sub>2</sub> films
atomic layer deposition
gas-sensitive properties
oxygen sensors
sensory effect
Online Access:https://www.mdpi.com/2072-666X/14/10/1875

Internet

https://www.mdpi.com/2072-666X/14/10/1875

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