Removal of SU8 fine patterns with N-Methyl-2-Pyrrolidone doped
SU8 is a negative photoresist shows superior characteristics of heat resistance and chemical resistance. And, it is used to make high-aspect ratio micro structures such as master of electroforming. However, it is extremely difficult to remove SU8 from substrate. Researchers have investigated a means...
| Main Authors: | , , , , |
|---|---|
| Format: | Article |
| Language: | Japanese |
| Published: |
The Japan Society of Mechanical Engineers
2018-05-01
|
| Series: | Nihon Kikai Gakkai ronbunshu |
| Subjects: | |
| Online Access: | https://www.jstage.jst.go.jp/article/transjsme/84/862/84_18-00091/_pdf/-char/en |