Removal of SU8 fine patterns with N-Methyl-2-Pyrrolidone doped
SU8 is a negative photoresist shows superior characteristics of heat resistance and chemical resistance. And, it is used to make high-aspect ratio micro structures such as master of electroforming. However, it is extremely difficult to remove SU8 from substrate. Researchers have investigated a means...
| Main Authors: | , , , , |
|---|---|
| Format: | Article |
| Language: | Japanese |
| Published: |
The Japan Society of Mechanical Engineers
2018-05-01
|
| Series: | Nihon Kikai Gakkai ronbunshu |
| Subjects: | |
| Online Access: | https://www.jstage.jst.go.jp/article/transjsme/84/862/84_18-00091/_pdf/-char/en |
| _version_ | 1798015082362306560 |
|---|---|
| author | Manabu YASUI Hitoshi NAKANO Masahito KUROUCHI Shin-ichi KAWANO Satoru KANEKO |
| author_facet | Manabu YASUI Hitoshi NAKANO Masahito KUROUCHI Shin-ichi KAWANO Satoru KANEKO |
| author_sort | Manabu YASUI |
| collection | DOAJ |
| description | SU8 is a negative photoresist shows superior characteristics of heat resistance and chemical resistance. And, it is used to make high-aspect ratio micro structures such as master of electroforming. However, it is extremely difficult to remove SU8 from substrate. Researchers have investigated a means of SU8 removal. Therefore we proposed a new SU8 removal method “DI water (H2O) and lithium chloride (LiCl) doped NMP” which promises swelling furtherance of SU8, and we demonstrated that the new method could remove fine SU8 patters from substrate at proper level. The mechanism of SU8 fine patterns removal is presented as follows. A doped NMP broadens the width of SU8 patterns by swelling effect and reduces buckling stress of SU8 patterns. SU8 patterns reducing buckling stress increases the potential of buckling. |
| first_indexed | 2024-04-11T15:28:42Z |
| format | Article |
| id | doaj.art-1c2a803f1a13433f9e37472372dfbf9f |
| institution | Directory Open Access Journal |
| issn | 2187-9761 |
| language | Japanese |
| last_indexed | 2024-04-11T15:28:42Z |
| publishDate | 2018-05-01 |
| publisher | The Japan Society of Mechanical Engineers |
| record_format | Article |
| series | Nihon Kikai Gakkai ronbunshu |
| spelling | doaj.art-1c2a803f1a13433f9e37472372dfbf9f2022-12-22T04:16:11ZjpnThe Japan Society of Mechanical EngineersNihon Kikai Gakkai ronbunshu2187-97612018-05-018486218-0009118-0009110.1299/transjsme.18-00091transjsmeRemoval of SU8 fine patterns with N-Methyl-2-Pyrrolidone dopedManabu YASUI0Hitoshi NAKANO1Masahito KUROUCHI2Shin-ichi KAWANO3Satoru KANEKO4Kanagawa Institute of Industrial Science and TechnologyNomura Micro Science Co., Ltd.Kanagawa Institute of Industrial Science and TechnologyNomura Micro Science Co., Ltd.Kanagawa Institute of Industrial Science and TechnologySU8 is a negative photoresist shows superior characteristics of heat resistance and chemical resistance. And, it is used to make high-aspect ratio micro structures such as master of electroforming. However, it is extremely difficult to remove SU8 from substrate. Researchers have investigated a means of SU8 removal. Therefore we proposed a new SU8 removal method “DI water (H2O) and lithium chloride (LiCl) doped NMP” which promises swelling furtherance of SU8, and we demonstrated that the new method could remove fine SU8 patters from substrate at proper level. The mechanism of SU8 fine patterns removal is presented as follows. A doped NMP broadens the width of SU8 patterns by swelling effect and reduces buckling stress of SU8 patterns. SU8 patterns reducing buckling stress increases the potential of buckling.https://www.jstage.jst.go.jp/article/transjsme/84/862/84_18-00091/_pdf/-char/ensu8removenmpliclh2o |
| spellingShingle | Manabu YASUI Hitoshi NAKANO Masahito KUROUCHI Shin-ichi KAWANO Satoru KANEKO Removal of SU8 fine patterns with N-Methyl-2-Pyrrolidone doped Nihon Kikai Gakkai ronbunshu su8 remove nmp licl h2o |
| title | Removal of SU8 fine patterns with N-Methyl-2-Pyrrolidone doped |
| title_full | Removal of SU8 fine patterns with N-Methyl-2-Pyrrolidone doped |
| title_fullStr | Removal of SU8 fine patterns with N-Methyl-2-Pyrrolidone doped |
| title_full_unstemmed | Removal of SU8 fine patterns with N-Methyl-2-Pyrrolidone doped |
| title_short | Removal of SU8 fine patterns with N-Methyl-2-Pyrrolidone doped |
| title_sort | removal of su8 fine patterns with n methyl 2 pyrrolidone doped |
| topic | su8 remove nmp licl h2o |
| url | https://www.jstage.jst.go.jp/article/transjsme/84/862/84_18-00091/_pdf/-char/en |
| work_keys_str_mv | AT manabuyasui removalofsu8finepatternswithnmethyl2pyrrolidonedoped AT hitoshinakano removalofsu8finepatternswithnmethyl2pyrrolidonedoped AT masahitokurouchi removalofsu8finepatternswithnmethyl2pyrrolidonedoped AT shinichikawano removalofsu8finepatternswithnmethyl2pyrrolidonedoped AT satorukaneko removalofsu8finepatternswithnmethyl2pyrrolidonedoped |