Removal of SU8 fine patterns with N-Methyl-2-Pyrrolidone doped
SU8 is a negative photoresist shows superior characteristics of heat resistance and chemical resistance. And, it is used to make high-aspect ratio micro structures such as master of electroforming. However, it is extremely difficult to remove SU8 from substrate. Researchers have investigated a means...
Main Authors: | Manabu YASUI, Hitoshi NAKANO, Masahito KUROUCHI, Shin-ichi KAWANO, Satoru KANEKO |
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Format: | Article |
Language: | Japanese |
Published: |
The Japan Society of Mechanical Engineers
2018-05-01
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Series: | Nihon Kikai Gakkai ronbunshu |
Subjects: | |
Online Access: | https://www.jstage.jst.go.jp/article/transjsme/84/862/84_18-00091/_pdf/-char/en |
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