Atomic-Level Sn Doping Effect in Ga<sub>2</sub>O<sub>3</sub> Films Using Plasma-Enhanced Atomic Layer Deposition
In this work, the atomic level doping of Sn into Ga<sub>2</sub>O<sub>3</sub> films was successfully deposited by using a plasma-enhanced atomic layer deposition method. Here, we systematically studied the changes in the chemical state, microstructure evolution, optical proper...
Main Authors: | , , , , , , |
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Format: | Article |
Language: | English |
Published: |
MDPI AG
2022-11-01
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Series: | Nanomaterials |
Subjects: | |
Online Access: | https://www.mdpi.com/2079-4991/12/23/4256 |