Wafer‐Level Manufacturing of MEMS H2 Sensing Chips Based on Pd Nanoparticles Modified SnO2 Film Patterns

Wafer‐Level Manufacturing of MEMS H2 Sensing Chips Based on Pd Nanoparticles Modified SnO2 Film Patterns

Abstract In this manuscript, a simple method combining atomic layer deposition and magnetron sputtering is developed to fabricate high‐performance Pd/SnO2 film patterns applied for micro‐electro‐mechanical systems (MEMS) H2 sensing chips. SnO2 film is first accurately deposited in the central areas...

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Bibliographic Details
Main Authors: Zheng Zhang, Liyang Luo, Yanlin Zhang, Guoliang Lv, Yuanyuan Luo, Guotao Duan
Format: Article
Language:English
Published: Wiley 2023-09-01
Series:Advanced Science
Subjects:
film patterns
H2 sensing chips
high‐consistency
micro‐electro‐mechanical systems
wafer‐level
Online Access:https://doi.org/10.1002/advs.202302614

Internet

https://doi.org/10.1002/advs.202302614

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