Growth Rates of HFCVD Diamond Films on Silicon Carbide Substrates for Heat Dissipation Applications

Growth Rates of HFCVD Diamond Films on Silicon Carbide Substrates for Heat Dissipation Applications

Diamond has an extremely high thermal conductivity, making it to have a great potential as a heat dissipation material. Based on the hot filament chemical vapor deposition (HFCVD) technique, diamond thick films were deposited on silicon carbide substrates by using the multi-step method in this paper...

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Bibliographic Details
Main Author: LI Weihan, QIAO Yu, SHU Da, WANG Xinchang
Format: Article
Language:zho
Published: Editorial Office of Journal of Shanghai Jiao Tong University 2023-08-01
Series:Shanghai Jiaotong Daxue xuebao
Subjects:
hot filament chemical vapor deposition (hfcvd)
diamond film
growth rate
quality
heat dissipation
Online Access:https://xuebao.sjtu.edu.cn/article/2023/1006-2467/1006-2467-57-8-1078.shtml

Internet

https://xuebao.sjtu.edu.cn/article/2023/1006-2467/1006-2467-57-8-1078.shtml

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