Process and mechanism of magnetorheological variable gap dynamic pressure planarization finishing
In order to improve the magnetorheological polishing efficiency of photoelectric wafer and realize its ultra smooth planarization, the magnetorheological variable gap dynamic pressure planarization method is proposed. The changes of material removal rate and surface roughness of sapphire wafer with...
| Main Authors: | , , , , |
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| Format: | Article |
| Language: | zho |
| Published: |
Zhengzhou Research Institute for Abrasives & Grinding Co., Ltd.
2022-08-01
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| Series: | Jin'gangshi yu moliao moju gongcheng |
| Subjects: | |
| Online Access: | http://www.jgszz.cn/article/doi/10.13394/j.cnki.jgszz.2022.0004 |