Near-field infrared nanoscopic study of EUV- and e-beam-exposed hydrogen silsesquioxane photoresist

Abstract This article presents a technique of scattering-type scanning near-field optical microscopy (s-SNOM) based on scanning probe microscopy as a nanoscale-resolution chemical visualization technique of the structural changes in photoresist thin films. Chemical investigations were conducted in t...

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Bibliographic Details
Main Authors: Jiho Kim, Jin-Kyun Lee, Boknam Chae, Jinho Ahn, Sangsul Lee
Format: Article
Language:English
Published: SpringerOpen 2022-12-01
Series:Nano Convergence
Subjects:
Online Access:https://doi.org/10.1186/s40580-022-00345-3