CISSY: A station for preparation and surface/interface analysis of thin film materials and devices
The CISSY end station combines thin film deposition (sputtering, molecular beam epitaxy ambient-pressure methods) with surface and bulk-sensitive analysis (photo emission, x-ray emission, x-ray absorption) in the same UHV system, allowing fast and contamination–free transfer between deposition and a...
| Main Authors: | , |
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| Format: | Article |
| Language: | English |
| Published: |
Forschungszentrum Jülich
2016-04-01
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| Series: | Journal of large-scale research facilities JLSRF |
| Online Access: | https://jlsrf.org/index.php/lsf/article/view/84 |