Effect of argon flow rate and direct current bias on the growth of boron nitride coating in low-temperature plasma
A microwave plasma chemical vapor deposition system was used to synthesize cubic boron nitride (cBN) coatings on diamond seeded silicon substrates using direct current (DC) bias. Effects of the argon (Ar) flow rate and bias voltage on the growth of the cBN coatings were investigated. Hydrogen (H2),...
| Main Authors: | , , , |
|---|---|
| Format: | Article |
| Language: | English |
| Published: |
AIP Publishing LLC
2022-08-01
|
| Series: | AIP Advances |
| Online Access: | http://dx.doi.org/10.1063/5.0102036 |