Reactive DC magnetron sputter deposition and structural properties of NiO thin films
Nickel oxide (NiO) films were deposited by using a homemade DC reactive magnetron sputtering system at different working pressure in the range (0.05-0.14)mbar. The effect of working pressure on the structure, surface morphology, optical of NiO films was investigated. X-ray diffraction (XRD) results...
| Main Authors: | , , , |
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| Format: | Article |
| Language: | English |
| Published: |
Unviversity of Technology- Iraq
2015-07-01
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| Series: | Engineering and Technology Journal |
| Subjects: | |
| Online Access: | https://etj.uotechnology.edu.iq/article_116476_a4599e5c81cc88c69cc2d07337046c0f.pdf |