Reactive DC magnetron sputter deposition and structural properties of NiO thin films
Nickel oxide (NiO) films were deposited by using a homemade DC reactive magnetron sputtering system at different working pressure in the range (0.05-0.14)mbar. The effect of working pressure on the structure, surface morphology, optical of NiO films was investigated. X-ray diffraction (XRD) results...
| Main Authors: | , , , |
|---|---|
| Format: | Article |
| Language: | English |
| Published: |
Unviversity of Technology- Iraq
2015-07-01
|
| Series: | Engineering and Technology Journal |
| Subjects: | |
| Online Access: | https://etj.uotechnology.edu.iq/article_116476_a4599e5c81cc88c69cc2d07337046c0f.pdf |
| _version_ | 1797325766898221056 |
|---|---|
| author | Ibrahim R. Agool Mohammed K. Khalaf Shaimaa H. Abd Muslim Riyadh N. Talaq |
| author_facet | Ibrahim R. Agool Mohammed K. Khalaf Shaimaa H. Abd Muslim Riyadh N. Talaq |
| author_sort | Ibrahim R. Agool |
| collection | DOAJ |
| description | Nickel oxide (NiO) films were deposited by using a homemade DC reactive magnetron sputtering system at different working pressure in the range (0.05-0.14)mbar. The effect of working pressure on the structure, surface morphology, optical of NiO films was investigated. X-ray diffraction (XRD) results suggested that the deposited films were formed by nanoparticles with average particle size in the range of (8.145-29.195) nm. And the films are identified to be polycrystalline nature with a cubic structure along (111) and (101) orientation also Ni2O3 was found by XRD. The texture of the films was observed using SEM and AFM, it was observed that the grain size was increased with working pressure. The energy band gap was found to be in the range of (4.1 eV to 3.9 eV) When the film thickness varying from 73 nm to 146.9 nm. |
| first_indexed | 2024-03-08T06:14:14Z |
| format | Article |
| id | doaj.art-205fe502ba3e4ccfbb0a3f127f6d52ed |
| institution | Directory Open Access Journal |
| issn | 1681-6900 2412-0758 |
| language | English |
| last_indexed | 2024-03-08T06:14:14Z |
| publishDate | 2015-07-01 |
| publisher | Unviversity of Technology- Iraq |
| record_format | Article |
| series | Engineering and Technology Journal |
| spelling | doaj.art-205fe502ba3e4ccfbb0a3f127f6d52ed2024-02-04T17:28:29ZengUnviversity of Technology- IraqEngineering and Technology Journal1681-69002412-07582015-07-01336B1082109210.30684/etj.2015.116476116476Reactive DC magnetron sputter deposition and structural properties of NiO thin filmsIbrahim R. AgoolMohammed K. KhalafShaimaa H. Abd MuslimRiyadh N. TalaqNickel oxide (NiO) films were deposited by using a homemade DC reactive magnetron sputtering system at different working pressure in the range (0.05-0.14)mbar. The effect of working pressure on the structure, surface morphology, optical of NiO films was investigated. X-ray diffraction (XRD) results suggested that the deposited films were formed by nanoparticles with average particle size in the range of (8.145-29.195) nm. And the films are identified to be polycrystalline nature with a cubic structure along (111) and (101) orientation also Ni2O3 was found by XRD. The texture of the films was observed using SEM and AFM, it was observed that the grain size was increased with working pressure. The energy band gap was found to be in the range of (4.1 eV to 3.9 eV) When the film thickness varying from 73 nm to 146.9 nm.https://etj.uotechnology.edu.iq/article_116476_a4599e5c81cc88c69cc2d07337046c0f.pdfnickel oxidemagnetronsputtering |
| spellingShingle | Ibrahim R. Agool Mohammed K. Khalaf Shaimaa H. Abd Muslim Riyadh N. Talaq Reactive DC magnetron sputter deposition and structural properties of NiO thin films Engineering and Technology Journal nickel oxide magnetron sputtering |
| title | Reactive DC magnetron sputter deposition and structural properties of NiO thin films |
| title_full | Reactive DC magnetron sputter deposition and structural properties of NiO thin films |
| title_fullStr | Reactive DC magnetron sputter deposition and structural properties of NiO thin films |
| title_full_unstemmed | Reactive DC magnetron sputter deposition and structural properties of NiO thin films |
| title_short | Reactive DC magnetron sputter deposition and structural properties of NiO thin films |
| title_sort | reactive dc magnetron sputter deposition and structural properties of nio thin films |
| topic | nickel oxide magnetron sputtering |
| url | https://etj.uotechnology.edu.iq/article_116476_a4599e5c81cc88c69cc2d07337046c0f.pdf |
| work_keys_str_mv | AT ibrahimragool reactivedcmagnetronsputterdepositionandstructuralpropertiesofniothinfilms AT mohammedkkhalaf reactivedcmagnetronsputterdepositionandstructuralpropertiesofniothinfilms AT shaimaahabdmuslim reactivedcmagnetronsputterdepositionandstructuralpropertiesofniothinfilms AT riyadhntalaq reactivedcmagnetronsputterdepositionandstructuralpropertiesofniothinfilms |