Reactive DC magnetron sputter deposition and structural properties of NiO thin films

Reactive DC magnetron sputter deposition and structural properties of NiO thin films

Nickel oxide (NiO) films were deposited by using a homemade DC reactive magnetron sputtering system at different working pressure in the range (0.05-0.14)mbar. The effect of working pressure on the structure, surface morphology, optical of NiO films was investigated. X-ray diffraction (XRD) results...

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Bibliographic Details
Main Authors: Ibrahim R. Agool, Mohammed K. Khalaf, Shaimaa H. Abd Muslim, Riyadh N. Talaq
Format: Article
Language:English
Published: Unviversity of Technology- Iraq 2015-07-01
Series:Engineering and Technology Journal
Subjects:
nickel oxide
magnetron
sputtering
Online Access:https://etj.uotechnology.edu.iq/article_116476_a4599e5c81cc88c69cc2d07337046c0f.pdf

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