Development of a Prototype of a Protective UV-C Half-Face Mask with Implementation of Additive Technology

The authors of this manuscript present development of a prototype protective UV-C half-face mask. The first stage of this study focuses on proposing a UV-C half-face mask design and the second phase investigates the quality of printings, 3D/2D roughness and porousness of three different printed samp...

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Bibliographic Details
Main Authors: Daniel Varecha, Ján Galík, František Brumerčík, Róbert Kohár, Rudolf Madaj, Mário Drbúl, Adam Glowacz, Witold Glowacz, Hui Liu
Format: Article
Language:English
Published: University of Žilina 2023-04-01
Series:Communications
Subjects:
Online Access:https://komunikacie.uniza.sk/artkey/csl-202302-0013_development-of-a-prototype-of-a-protective-uv-c-half-face-mask-with-implementation-of-additive-technology.php