Ultrathin oxynitride films for CMOS technology
In this work, a review of possible methods of oxynitride film formation will be given. These are different combinations of methods applying high-temperature oxidation and nitridation, as well as ion implantation and deposition techniques. The layers obtained using these methods differ, among other...
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| Format: | Article |
| Language: | English |
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National Institute of Telecommunications
2004-03-01
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| Series: | Journal of Telecommunications and Information Technology |
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| Online Access: | https://jtit.pl/jtit/article/view/228 |