Structural, Morphological, Vibrational and Optical Properties of GaN Films Grown by Reactive Sputtering: The Effect of RF Power at Low Working Pressure Limit

Structural, Morphological, Vibrational and Optical Properties of GaN Films Grown by Reactive Sputtering: The Effect of RF Power at Low Working Pressure Limit

Abstract This work reports the properties of GaN films grown onto c-Si (100) at relatively low substrate temperature (400°C) by reactive magnetron sputtering. The study depicts the effect of working pressure and RF power on the GaN film structural, vibrational and optical properties characterized by...

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Bibliographic Details
Main Authors: R. S. de Oliveira, H. A. Folli, C. Stegemann, I. M. Horta, B. S. Damasceno, W. Miyakawa, A. L. J. Pereira, M. Massi, A. S. da Silva Sobrinho, D. M. G. Leite
Format: Article
Language:English
Published: Associação Brasileira de Metalurgia e Materiais (ABM); Associação Brasileira de Cerâmica (ABC); Associação Brasileira de Polímeros (ABPol) 2022-01-01
Series:Materials Research
Subjects:
GaN
reactive sputtering
thin film
Online Access:http://www.scielo.br/scielo.php?script=sci_arttext&pid=S1516-14392022000100240&lng=en&tlng=en

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http://www.scielo.br/scielo.php?script=sci_arttext&pid=S1516-14392022000100240&lng=en&tlng=en

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