Heteroepitaxial Ge-on-Si by DC magnetron sputtering
The growth of Ge on Si(100) by DC Magnetron Sputtering at various temperatures is studied by Spectroscopic Ellipsometry and Transmission Electron Microscopy. Smooth heteroepitaxial Ge films are prepared at relatively low temperatures of 380°C. Typical Stransky-Krastanov growth is observed at 410°C....
Main Authors: | Martin Steglich, Christian Patzig, Lutz Berthold, Frank Schrempel, Kevin Füchsel, Thomas Höche, Ernst-Bernhard Kley, Andreas Tünnermann |
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Format: | Article |
Language: | English |
Published: |
AIP Publishing LLC
2013-07-01
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Series: | AIP Advances |
Online Access: | http://link.aip.org/link/doi/10.1063/1.4813841 |
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