Magnetron sputtering cathode for low power density operation
A novel magnetron sputtering cathode with a magnetic mirror configuration is proposed, for low power density operation. The magnetic field profiles are simply constructed using two cylindrical permanent magnets positioned behind the disk-shaped sputtering target of 50 mm in diameter. The magnetic mi...
| Main Authors: | , |
|---|---|
| Format: | Article |
| Language: | English |
| Published: |
AIP Publishing LLC
2017-12-01
|
| Series: | AIP Advances |
| Online Access: | http://dx.doi.org/10.1063/1.5013341 |