Effect of Annealing on the Thermoelectricity Properties of the WRe26-In<sub>2</sub>O<sub>3</sub> Thin Film Thermocouples
WRe26-In<sub>2</sub>O<sub>3</sub> (WRe26 (tungsten-26% rhenium) and In<sub>2</sub>O<sub>3</sub> thermoelectric materials) thin film thermocouples (TFTCs) have been fabricated based on magnetron sputtering technology, which can be used in temperature me...
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| Format: | Article |
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MDPI AG
2020-07-01
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| Series: | Micromachines |
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| Online Access: | https://www.mdpi.com/2072-666X/11/7/664 |
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| author | Bian Tian Yan Liu Zhongkai Zhang Zhaojun Liu Libo Zhao Qijing Lin Peng Shi Qi Mao Dejiang Lu Zhuangde Jiang |
| author_facet | Bian Tian Yan Liu Zhongkai Zhang Zhaojun Liu Libo Zhao Qijing Lin Peng Shi Qi Mao Dejiang Lu Zhuangde Jiang |
| author_sort | Bian Tian |
| collection | DOAJ |
| description | WRe26-In<sub>2</sub>O<sub>3</sub> (WRe26 (tungsten-26% rhenium) and In<sub>2</sub>O<sub>3</sub> thermoelectric materials) thin film thermocouples (TFTCs) have been fabricated based on magnetron sputtering technology, which can be used in temperature measurement. Many annealing processes were studied to promote the sensitivity of WRe26-In<sub>2</sub>O<sub>3</sub> TFTCs. The optimal annealing process of the thermocouple under this kind of RF magnetron sputtering method was proposed after analyzing the properties of In<sub>2</sub>O<sub>3</sub> films and the thermoelectric voltage of TFTCs at different annealing processes. The calibration results showed that the WRe26-In<sub>2</sub>O<sub>3</sub> TFTCs achieved a thermoelectric voltage of 123.6 mV at a temperature difference of 612.9 K, with a sensitivity of up to 201.6 µV/K. Also, TFTC kept a stable thermoelectric voltage output at 973 K for 20 min and at 773 K for two hours. In general, the WRe26-In<sub>2</sub>O<sub>3</sub> TFTCs developed in this work have great potential for practical applications. In future work, we will focus on the thermoelectric stability of TFTCs at higher temperatures. |
| first_indexed | 2024-03-10T18:37:14Z |
| format | Article |
| id | doaj.art-222492d5146546b39f549ed51d156499 |
| institution | Directory Open Access Journal |
| issn | 2072-666X |
| language | English |
| last_indexed | 2024-03-10T18:37:14Z |
| publishDate | 2020-07-01 |
| publisher | MDPI AG |
| record_format | Article |
| series | Micromachines |
| spelling | doaj.art-222492d5146546b39f549ed51d1564992023-11-20T06:06:46ZengMDPI AGMicromachines2072-666X2020-07-0111766410.3390/mi11070664Effect of Annealing on the Thermoelectricity Properties of the WRe26-In<sub>2</sub>O<sub>3</sub> Thin Film ThermocouplesBian Tian0Yan Liu1Zhongkai Zhang2Zhaojun Liu3Libo Zhao4Qijing Lin5Peng Shi6Qi Mao7Dejiang Lu8Zhuangde Jiang9State Key Laboratory for Mechanical Manufacturing Systems Engineering, Xi’an Jiaotong University, Xi’an 710049, ChinaState Key Laboratory for Mechanical Manufacturing Systems Engineering, Xi’an Jiaotong University, Xi’an 710049, ChinaState Key Laboratory for Mechanical Manufacturing Systems Engineering, Xi’an Jiaotong University, Xi’an 710049, ChinaState Key Laboratory for Mechanical Manufacturing Systems Engineering, Xi’an Jiaotong University, Xi’an 710049, ChinaState Key Laboratory for Mechanical Manufacturing Systems Engineering, Xi’an Jiaotong University, Xi’an 710049, ChinaState Key Laboratory for Mechanical Manufacturing Systems Engineering, Xi’an Jiaotong University, Xi’an 710049, ChinaElectronic Materials Research Laboratory, Key Laboratory of the Ministry of Education & International Center for Dielectric Research, Xi’an Jiaotong University, Xi’an 710049, ChinaState Key Laboratory for Mechanical Manufacturing Systems Engineering, Xi’an Jiaotong University, Xi’an 710049, ChinaState Key Laboratory for Mechanical Manufacturing Systems Engineering, Xi’an Jiaotong University, Xi’an 710049, ChinaState Key Laboratory for Mechanical Manufacturing Systems Engineering, Xi’an Jiaotong University, Xi’an 710049, ChinaWRe26-In<sub>2</sub>O<sub>3</sub> (WRe26 (tungsten-26% rhenium) and In<sub>2</sub>O<sub>3</sub> thermoelectric materials) thin film thermocouples (TFTCs) have been fabricated based on magnetron sputtering technology, which can be used in temperature measurement. Many annealing processes were studied to promote the sensitivity of WRe26-In<sub>2</sub>O<sub>3</sub> TFTCs. The optimal annealing process of the thermocouple under this kind of RF magnetron sputtering method was proposed after analyzing the properties of In<sub>2</sub>O<sub>3</sub> films and the thermoelectric voltage of TFTCs at different annealing processes. The calibration results showed that the WRe26-In<sub>2</sub>O<sub>3</sub> TFTCs achieved a thermoelectric voltage of 123.6 mV at a temperature difference of 612.9 K, with a sensitivity of up to 201.6 µV/K. Also, TFTC kept a stable thermoelectric voltage output at 973 K for 20 min and at 773 K for two hours. In general, the WRe26-In<sub>2</sub>O<sub>3</sub> TFTCs developed in this work have great potential for practical applications. In future work, we will focus on the thermoelectric stability of TFTCs at higher temperatures.https://www.mdpi.com/2072-666X/11/7/664WRe26-In<sub>2</sub>O<sub>3</sub> thin filmsthermocouplesannealingmagnetron sputtering |
| spellingShingle | Bian Tian Yan Liu Zhongkai Zhang Zhaojun Liu Libo Zhao Qijing Lin Peng Shi Qi Mao Dejiang Lu Zhuangde Jiang Effect of Annealing on the Thermoelectricity Properties of the WRe26-In<sub>2</sub>O<sub>3</sub> Thin Film Thermocouples Micromachines WRe26-In<sub>2</sub>O<sub>3</sub> thin films thermocouples annealing magnetron sputtering |
| title | Effect of Annealing on the Thermoelectricity Properties of the WRe26-In<sub>2</sub>O<sub>3</sub> Thin Film Thermocouples |
| title_full | Effect of Annealing on the Thermoelectricity Properties of the WRe26-In<sub>2</sub>O<sub>3</sub> Thin Film Thermocouples |
| title_fullStr | Effect of Annealing on the Thermoelectricity Properties of the WRe26-In<sub>2</sub>O<sub>3</sub> Thin Film Thermocouples |
| title_full_unstemmed | Effect of Annealing on the Thermoelectricity Properties of the WRe26-In<sub>2</sub>O<sub>3</sub> Thin Film Thermocouples |
| title_short | Effect of Annealing on the Thermoelectricity Properties of the WRe26-In<sub>2</sub>O<sub>3</sub> Thin Film Thermocouples |
| title_sort | effect of annealing on the thermoelectricity properties of the wre26 in sub 2 sub o sub 3 sub thin film thermocouples |
| topic | WRe26-In<sub>2</sub>O<sub>3</sub> thin films thermocouples annealing magnetron sputtering |
| url | https://www.mdpi.com/2072-666X/11/7/664 |
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