PIV measurement of vortical structures in a model of semiconductor single wafer cleaner
In a single wafer spin cleaner, the wafer is rotated at high speed to spin off ultrapure water and clean air is blown perpendicular onto the surface to dry the wafer. Interaction between the rotating wafer and blown air generates vortices and the recirculation flow due to the vortices may cause reat...
| Main Authors: | , , , , |
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| Format: | Article |
| Language: | Japanese |
| Published: |
The Japan Society of Mechanical Engineers
2014-07-01
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| Series: | Nihon Kikai Gakkai ronbunshu |
| Subjects: | |
| Online Access: | https://www.jstage.jst.go.jp/article/transjsme/80/815/80_2014fe0197/_pdf/-char/en |