Memory Effects in Nanolaminates of Hafnium and Iron Oxide Films Structured by Atomic Layer Deposition

Memory Effects in Nanolaminates of Hafnium and Iron Oxide Films Structured by Atomic Layer Deposition

HfO<sub>2</sub> and Fe<sub>2</sub>O<sub>3</sub> thin films and laminated stacks were grown by atomic layer deposition at 350 °C from hafnium tetrachloride, ferrocene, and ozone. Nonlinear, saturating, and hysteretic magnetization was recorded in the films. Magneti...

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Bibliographic Details
Main Authors: Kristjan Kalam, Markus Otsus, Jekaterina Kozlova, Aivar Tarre, Aarne Kasikov, Raul Rammula, Joosep Link, Raivo Stern, Guillermo Vinuesa, José Miguel Lendínez, Salvador Dueñas, Helena Castán, Aile Tamm, Kaupo Kukli
Format: Article
Language:English
Published: MDPI AG 2022-07-01
Series:Nanomaterials
Subjects:
multilayers
atomic layer deposition
hafnium oxide
iron oxide
ferromagnetism
resistive switching
Online Access:https://www.mdpi.com/2079-4991/12/15/2593

Internet

https://www.mdpi.com/2079-4991/12/15/2593

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