High numerical aperture metalens to generate an energy backflow
Using electronic beam lithography and reactive ion beam etching, a metalens is manufactured in a thin layer of amorphous silicon of a 130-nm depth, a 30-µm diameter, and a 633-nm focal length (equal to the illumination wavelength). The metalens is composed of 16 sectored subwavelength binary grating...
| Main Authors: | , , , |
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| Format: | Article |
| Language: | English |
| Published: |
Samara National Research University
2020-10-01
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| Series: | Компьютерная оптика |
| Subjects: | |
| Online Access: | http://www.computeroptics.smr.ru/eng/KO/Annot/KO44-5/440502e.html |