Improved Low-Frequency Noise in Recessed-Gate E-Mode AlGaN/GaN MOS-HEMTs Under Electrical and Thermal Stress

Improved Low-Frequency Noise in Recessed-Gate E-Mode AlGaN/GaN MOS-HEMTs Under Electrical and Thermal Stress

1/f noise provides essential information on the interface trapping effect as well as the scattering mechanism in transistors. In this work, a systematic 1/f noise study has been carried out on the recessed-gate enhancement-mode (E-mode) GaN MOS-HEMTs under electrical and thermal stress together with...

Täydet tiedot

Bibliografiset tiedot
Päätekijät: Qianlan Hu, Chengru Gu, Dan Zhan, Xuefei Li, Yanqing Wu
Aineistotyyppi: Artikkeli
Kieli:English
Julkaistu: IEEE 2021-01-01
Sarja:IEEE Journal of the Electron Devices Society
Aiheet:
GaN MOS-HEMTs
1/f noise
trapping effect
phonon scattering
carrier-number-fluctuation
mobility-fluctuation
Linkit:https://ieeexplore.ieee.org/document/9417086/

Internet

https://ieeexplore.ieee.org/document/9417086/

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