Electrical Properties of Aluminum Nitride Thick Films Magnetron Sputtered on Aluminum Substrates

The realization of a c-axis oriented aluminum nitride thick film on aluminum substrates is a promising step in the development of transducers for applications with a working temperature up to about 600 °C. The present paper deals with the realization of AlN thick films by means of reactive magnetron...

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Bibliographic Details
Main Authors: Daniele Desideri, Enrico Bernardo, Alain Jody Corso, Federico Moro, Maria Guglielmina Pelizzo
Format: Article
Language:English
Published: MDPI AG 2022-03-01
Series:Materials
Subjects:
Online Access:https://www.mdpi.com/1996-1944/15/6/2090