Rapid formation of large-area MoS2 monolayers by a parameter resilient atomic layer deposition approach
In this work, an atomic layer deposition approach for the synthesis of MoS2 monolayers is presented. Optical properties of the prepared large-area samples were characterized by Raman and photoluminescence (PL) spectroscopies, yielding homogeneous optical properties in 5 × 5 mm2 areas. High-resolutio...
| Váldodahkkit: | , , , , , , |
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| Materiálatiipa: | Artihkal |
| Giella: | English |
| Almmustuhtton: |
AIP Publishing LLC
2021-05-01
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| Ráidu: | APL Materials |
| Liŋkkat: | http://dx.doi.org/10.1063/5.0041042 |