Conformal SiO2 coating of sub-100 nm diameter channels of polycarbonate etched ion-track channels by atomic layer deposition

Conformal SiO2 coating of sub-100 nm diameter channels of polycarbonate etched ion-track channels by atomic layer deposition

Polycarbonate etched ion-track membranes with about 30 µm long and 50 nm wide cylindrical channels were conformally coated with SiO2 by atomic layer deposition (ALD). The process was performed at 50 °C to avoid thermal damage to the polymer membrane. Analysis of the coated membranes by small angle X...

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Bibliographic Details
Main Authors: Nicolas Sobel, Christian Hess, Manuela Lukas, Anne Spende, Bernd Stühn, M. E. Toimil-Molares, Christina Trautmann
Format: Article
Language:English
Published: Beilstein-Institut 2015-02-01
Series:Beilstein Journal of Nanotechnology
Subjects:
atomic layer deposition (ALD)
ion-track technology
nanochannels
polycarbonate
silica (SiO2)
small angle X-ray scattering (SAXS)
track-etched channels
X-ray photoelectron spectroscopy (XPS)
Online Access:https://doi.org/10.3762/bjnano.6.48

Internet

https://doi.org/10.3762/bjnano.6.48

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