Conformal SiO2 coating of sub-100 nm diameter channels of polycarbonate etched ion-track channels by atomic layer deposition
Polycarbonate etched ion-track membranes with about 30 µm long and 50 nm wide cylindrical channels were conformally coated with SiO2 by atomic layer deposition (ALD). The process was performed at 50 °C to avoid thermal damage to the polymer membrane. Analysis of the coated membranes by small angle X...
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Format: | Article |
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Beilstein-Institut
2015-02-01
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Series: | Beilstein Journal of Nanotechnology |
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Online Access: | https://doi.org/10.3762/bjnano.6.48 |
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author | Nicolas Sobel Christian Hess Manuela Lukas Anne Spende Bernd Stühn M. E. Toimil-Molares Christina Trautmann |
author_facet | Nicolas Sobel Christian Hess Manuela Lukas Anne Spende Bernd Stühn M. E. Toimil-Molares Christina Trautmann |
author_sort | Nicolas Sobel |
collection | DOAJ |
description | Polycarbonate etched ion-track membranes with about 30 µm long and 50 nm wide cylindrical channels were conformally coated with SiO2 by atomic layer deposition (ALD). The process was performed at 50 °C to avoid thermal damage to the polymer membrane. Analysis of the coated membranes by small angle X-ray scattering (SAXS) reveals a homogeneous, conformal layer of SiO2 in the channels at a deposition rate of 1.7–1.8 Å per ALD cycle. Characterization by infrared and X-ray photoelectron spectroscopy (XPS) confirms the stoichiometric composition of the SiO2 films. Detailed XPS analysis reveals that the mechanism of SiO2 formation is based on subsurface crystal growth. By dissolving the polymer, the silica nanotubes are released from the ion-track membrane. The thickness of the tube wall is well controlled by the ALD process. Because the track-etched channels exhibited diameters in the range of nanometres and lengths in the range of micrometres, cylindrical tubes with an aspect ratio as large as 3000 have been produced. |
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issn | 2190-4286 |
language | English |
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publishDate | 2015-02-01 |
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spelling | doaj.art-24329da59c8b45e083993769a7ef9e642022-12-21T17:59:51ZengBeilstein-InstitutBeilstein Journal of Nanotechnology2190-42862015-02-016147247910.3762/bjnano.6.482190-4286-6-48Conformal SiO2 coating of sub-100 nm diameter channels of polycarbonate etched ion-track channels by atomic layer depositionNicolas Sobel0Christian Hess1Manuela Lukas2Anne Spende3Bernd Stühn4M. E. Toimil-Molares5Christina Trautmann6Eduard-Zintl-Institut für Anorganische und Physikalische Chemie, Technische Universität Darmstadt, Alarich-Weiss-Str. 8, 64287 Darmstadt, GermanyEduard-Zintl-Institut für Anorganische und Physikalische Chemie, Technische Universität Darmstadt, Alarich-Weiss-Str. 8, 64287 Darmstadt, GermanyInstitute of Condensed Matter Physics, Technische Universität Darmstadt, Hochschulstraße 8, 64289 Darmstadt, GermanyMaterials Research Department, GSI Helmholtz Centre for Heavy Ion Research, Planckstr. 1, 64291 Darmstadt, GermanyInstitute of Condensed Matter Physics, Technische Universität Darmstadt, Hochschulstraße 8, 64289 Darmstadt, GermanyMaterials Research Department, GSI Helmholtz Centre for Heavy Ion Research, Planckstr. 1, 64291 Darmstadt, GermanyMaterials Research Department, GSI Helmholtz Centre for Heavy Ion Research, Planckstr. 1, 64291 Darmstadt, GermanyPolycarbonate etched ion-track membranes with about 30 µm long and 50 nm wide cylindrical channels were conformally coated with SiO2 by atomic layer deposition (ALD). The process was performed at 50 °C to avoid thermal damage to the polymer membrane. Analysis of the coated membranes by small angle X-ray scattering (SAXS) reveals a homogeneous, conformal layer of SiO2 in the channels at a deposition rate of 1.7–1.8 Å per ALD cycle. Characterization by infrared and X-ray photoelectron spectroscopy (XPS) confirms the stoichiometric composition of the SiO2 films. Detailed XPS analysis reveals that the mechanism of SiO2 formation is based on subsurface crystal growth. By dissolving the polymer, the silica nanotubes are released from the ion-track membrane. The thickness of the tube wall is well controlled by the ALD process. Because the track-etched channels exhibited diameters in the range of nanometres and lengths in the range of micrometres, cylindrical tubes with an aspect ratio as large as 3000 have been produced.https://doi.org/10.3762/bjnano.6.48atomic layer deposition (ALD)ion-track technologynanochannelspolycarbonatesilica (SiO2)small angle X-ray scattering (SAXS)track-etched channelsX-ray photoelectron spectroscopy (XPS) |
spellingShingle | Nicolas Sobel Christian Hess Manuela Lukas Anne Spende Bernd Stühn M. E. Toimil-Molares Christina Trautmann Conformal SiO2 coating of sub-100 nm diameter channels of polycarbonate etched ion-track channels by atomic layer deposition Beilstein Journal of Nanotechnology atomic layer deposition (ALD) ion-track technology nanochannels polycarbonate silica (SiO2) small angle X-ray scattering (SAXS) track-etched channels X-ray photoelectron spectroscopy (XPS) |
title | Conformal SiO2 coating of sub-100 nm diameter channels of polycarbonate etched ion-track channels by atomic layer deposition |
title_full | Conformal SiO2 coating of sub-100 nm diameter channels of polycarbonate etched ion-track channels by atomic layer deposition |
title_fullStr | Conformal SiO2 coating of sub-100 nm diameter channels of polycarbonate etched ion-track channels by atomic layer deposition |
title_full_unstemmed | Conformal SiO2 coating of sub-100 nm diameter channels of polycarbonate etched ion-track channels by atomic layer deposition |
title_short | Conformal SiO2 coating of sub-100 nm diameter channels of polycarbonate etched ion-track channels by atomic layer deposition |
title_sort | conformal sio2 coating of sub 100 nm diameter channels of polycarbonate etched ion track channels by atomic layer deposition |
topic | atomic layer deposition (ALD) ion-track technology nanochannels polycarbonate silica (SiO2) small angle X-ray scattering (SAXS) track-etched channels X-ray photoelectron spectroscopy (XPS) |
url | https://doi.org/10.3762/bjnano.6.48 |
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