Conformal SiO2 coating of sub-100 nm diameter channels of polycarbonate etched ion-track channels by atomic layer deposition

Polycarbonate etched ion-track membranes with about 30 µm long and 50 nm wide cylindrical channels were conformally coated with SiO2 by atomic layer deposition (ALD). The process was performed at 50 °C to avoid thermal damage to the polymer membrane. Analysis of the coated membranes by small angle X...

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Main Authors: Nicolas Sobel, Christian Hess, Manuela Lukas, Anne Spende, Bernd Stühn, M. E. Toimil-Molares, Christina Trautmann
Format: Article
Language:English
Published: Beilstein-Institut 2015-02-01
Series:Beilstein Journal of Nanotechnology
Subjects:
Online Access:https://doi.org/10.3762/bjnano.6.48
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author Nicolas Sobel
Christian Hess
Manuela Lukas
Anne Spende
Bernd Stühn
M. E. Toimil-Molares
Christina Trautmann
author_facet Nicolas Sobel
Christian Hess
Manuela Lukas
Anne Spende
Bernd Stühn
M. E. Toimil-Molares
Christina Trautmann
author_sort Nicolas Sobel
collection DOAJ
description Polycarbonate etched ion-track membranes with about 30 µm long and 50 nm wide cylindrical channels were conformally coated with SiO2 by atomic layer deposition (ALD). The process was performed at 50 °C to avoid thermal damage to the polymer membrane. Analysis of the coated membranes by small angle X-ray scattering (SAXS) reveals a homogeneous, conformal layer of SiO2 in the channels at a deposition rate of 1.7–1.8 Å per ALD cycle. Characterization by infrared and X-ray photoelectron spectroscopy (XPS) confirms the stoichiometric composition of the SiO2 films. Detailed XPS analysis reveals that the mechanism of SiO2 formation is based on subsurface crystal growth. By dissolving the polymer, the silica nanotubes are released from the ion-track membrane. The thickness of the tube wall is well controlled by the ALD process. Because the track-etched channels exhibited diameters in the range of nanometres and lengths in the range of micrometres, cylindrical tubes with an aspect ratio as large as 3000 have been produced.
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spelling doaj.art-24329da59c8b45e083993769a7ef9e642022-12-21T17:59:51ZengBeilstein-InstitutBeilstein Journal of Nanotechnology2190-42862015-02-016147247910.3762/bjnano.6.482190-4286-6-48Conformal SiO2 coating of sub-100 nm diameter channels of polycarbonate etched ion-track channels by atomic layer depositionNicolas Sobel0Christian Hess1Manuela Lukas2Anne Spende3Bernd Stühn4M. E. Toimil-Molares5Christina Trautmann6Eduard-Zintl-Institut für Anorganische und Physikalische Chemie, Technische Universität Darmstadt, Alarich-Weiss-Str. 8, 64287 Darmstadt, GermanyEduard-Zintl-Institut für Anorganische und Physikalische Chemie, Technische Universität Darmstadt, Alarich-Weiss-Str. 8, 64287 Darmstadt, GermanyInstitute of Condensed Matter Physics, Technische Universität Darmstadt, Hochschulstraße 8, 64289 Darmstadt, GermanyMaterials Research Department, GSI Helmholtz Centre for Heavy Ion Research, Planckstr. 1, 64291 Darmstadt, GermanyInstitute of Condensed Matter Physics, Technische Universität Darmstadt, Hochschulstraße 8, 64289 Darmstadt, GermanyMaterials Research Department, GSI Helmholtz Centre for Heavy Ion Research, Planckstr. 1, 64291 Darmstadt, GermanyMaterials Research Department, GSI Helmholtz Centre for Heavy Ion Research, Planckstr. 1, 64291 Darmstadt, GermanyPolycarbonate etched ion-track membranes with about 30 µm long and 50 nm wide cylindrical channels were conformally coated with SiO2 by atomic layer deposition (ALD). The process was performed at 50 °C to avoid thermal damage to the polymer membrane. Analysis of the coated membranes by small angle X-ray scattering (SAXS) reveals a homogeneous, conformal layer of SiO2 in the channels at a deposition rate of 1.7–1.8 Å per ALD cycle. Characterization by infrared and X-ray photoelectron spectroscopy (XPS) confirms the stoichiometric composition of the SiO2 films. Detailed XPS analysis reveals that the mechanism of SiO2 formation is based on subsurface crystal growth. By dissolving the polymer, the silica nanotubes are released from the ion-track membrane. The thickness of the tube wall is well controlled by the ALD process. Because the track-etched channels exhibited diameters in the range of nanometres and lengths in the range of micrometres, cylindrical tubes with an aspect ratio as large as 3000 have been produced.https://doi.org/10.3762/bjnano.6.48atomic layer deposition (ALD)ion-track technologynanochannelspolycarbonatesilica (SiO2)small angle X-ray scattering (SAXS)track-etched channelsX-ray photoelectron spectroscopy (XPS)
spellingShingle Nicolas Sobel
Christian Hess
Manuela Lukas
Anne Spende
Bernd Stühn
M. E. Toimil-Molares
Christina Trautmann
Conformal SiO2 coating of sub-100 nm diameter channels of polycarbonate etched ion-track channels by atomic layer deposition
Beilstein Journal of Nanotechnology
atomic layer deposition (ALD)
ion-track technology
nanochannels
polycarbonate
silica (SiO2)
small angle X-ray scattering (SAXS)
track-etched channels
X-ray photoelectron spectroscopy (XPS)
title Conformal SiO2 coating of sub-100 nm diameter channels of polycarbonate etched ion-track channels by atomic layer deposition
title_full Conformal SiO2 coating of sub-100 nm diameter channels of polycarbonate etched ion-track channels by atomic layer deposition
title_fullStr Conformal SiO2 coating of sub-100 nm diameter channels of polycarbonate etched ion-track channels by atomic layer deposition
title_full_unstemmed Conformal SiO2 coating of sub-100 nm diameter channels of polycarbonate etched ion-track channels by atomic layer deposition
title_short Conformal SiO2 coating of sub-100 nm diameter channels of polycarbonate etched ion-track channels by atomic layer deposition
title_sort conformal sio2 coating of sub 100 nm diameter channels of polycarbonate etched ion track channels by atomic layer deposition
topic atomic layer deposition (ALD)
ion-track technology
nanochannels
polycarbonate
silica (SiO2)
small angle X-ray scattering (SAXS)
track-etched channels
X-ray photoelectron spectroscopy (XPS)
url https://doi.org/10.3762/bjnano.6.48
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