Roles of Atomic Nitrogen/Hydrogen in GaN Film Growth by Chemically Assisted Sputtering with Dual Plasma Sources

Geahča maid

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  Almmustuhtton: (2024-05-01)
• Author Correction: Epitaxial growth of high-quality GaN with a high growth rate at low temperatures by radical-enhanced metalorganic chemical vapor deposition
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  Almmustuhtton: (2024-12-01)
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  Almmustuhtton: (2018-11-01)
• Photoluminescence recovery by in-situ exposure of plasma-damaged n-GaN to atomic hydrogen at room temperature
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  Almmustuhtton: (2012-06-01)
• Study of sputtered tin schottky barrier diode for Gan-hemt applications
  Dahkki: Li, Kang
  Almmustuhtton: (2016)