The growth of InAlN/Si heterostructures with a high content of In

InAlN films on Si (111) were obtained by the ion-beam deposition with various technological growth parameters. The results of the study of grown films by the scanning electron microscopy were used to identify the conditions for obtaining InAlN continuous films. Due to the mismatch of the lattice par...

Full description

Bibliographic Details
Main Authors: V.A. Lapin, I.V. Kasyanov
Format: Article
Language:Russian
Published: Tver State University 2022-12-01
Series:Физико-химические аспекты изучения кластеров, наноструктур и наноматериалов
Subjects:
Online Access:https://physchemaspects.ru/2022/doi-10-26456-pcascnn-2022-14-168/?lang=en