Effect of Annealing Temperature on Spatial Atomic Layer Deposited Titanium Oxide and Its Application in Perovskite Solar Cells

In this study, spatial atomic layer deposition (sALD) is employed to prepare titanium dioxide (TiO<sub>2</sub>) thin films by using titanium tetraisopropoxide and water as metal and water precursors, respectively. The post-annealing temperature is varied to investigate its effect on the...

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Bibliographic Details
Main Authors: Chia-Hsun Hsu, Ka-Te Chen, Pao-Hsun Huang, Wan-Yu Wu, Xiao-Ying Zhang, Chen Wang, Lu-Sheng Liang, Peng Gao, Yu Qiu, Shui-Yang Lien, Zhan-Bo Su, Zi-Rong Chen, Wen-Zhang Zhu
Format: Article
Language:English
Published: MDPI AG 2020-07-01
Series:Nanomaterials
Subjects:
Online Access:https://www.mdpi.com/2079-4991/10/7/1322