Dry Phosphorus silicate glass etching and surface conditioning and cleaning for multi-crystalline silicon solar cell processing

Dry Phosphorus silicate glass etching and surface conditioning and cleaning for multi-crystalline silicon solar cell processing

As an alternative to the wet chemical etching method, dry chemical etching processes for Phosphorus silicate glass [PSG} layer rel11ova] using Trifluormethane/Sulfur Hexafluoride (CHF3/ SF6) gas mixture in commercial silicon-nitride plasma enhanced chemical vapour deposition (SiN-PECVD) system is app...

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Bibliographic Details
Main Author: Ahmed S. Kagilik
Format: Article
Language:Arabic
Published: Libyan Center for Solar Energy REsearch and Studies 2014-06-01
Series:Solar Energy and Sustainable Development
Subjects:
Solar Cells
crystalline silicon
PSG
Plasma etching;
Online Access:http://www.jsesd.csers.ly/index.php/en/journal-papers/20-vol-003/33-vol-003-04

Internet

http://www.jsesd.csers.ly/index.php/en/journal-papers/20-vol-003/33-vol-003-04

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