Comparison between Bosch and STiGer Processes for Deep Silicon Etching

The cryogenic process is well known to etch high aspect ratio features in silicon with smooth sidewalls. A time-multiplexed cryogenic process, called STiGer, was developed in 2006 and patented. Like the Bosch process, it consists in repeating cycles composed of an isotropic etching step followed by...

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Bibliographic Details
Main Authors: Thomas Tillocher, Jack Nos, Gaëlle Antoun, Philippe Lefaucheux, Mohamed Boufnichel, Rémi Dussart
Format: Article
Language:English
Published: MDPI AG 2021-09-01
Series:Micromachines
Subjects:
Online Access:https://www.mdpi.com/2072-666X/12/10/1143