Towards achieving a large-area and defect-free nano-line pattern via controlled self-assembly by sequential annealing
Utilizing the controlled self-assembling of a giant surfactant, a bottom-up method for constructing line gratings with sub-10 nm resolution has been developed. Via a simple solvent vapor annealing procedure, the giant surfactant comprised of an oligomeric silsesquioxane (DPOSS) and polystyrene (PS)...
Main Authors: | , , , , , , , |
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Format: | Article |
Language: | English |
Published: |
Elsevier
2021-12-01
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Series: | Giant |
Subjects: | |
Online Access: | http://www.sciencedirect.com/science/article/pii/S2666542521000345 |