Towards achieving a large-area and defect-free nano-line pattern via controlled self-assembly by sequential annealing

Utilizing the controlled self-assembling of a giant surfactant, a bottom-up method for constructing line gratings with sub-10 nm resolution has been developed. Via a simple solvent vapor annealing procedure, the giant surfactant comprised of an oligomeric silsesquioxane (DPOSS) and polystyrene (PS)...

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Bibliographic Details
Main Authors: Tao Wen, Bo Ni, Yuchu Liu, Wei Zhang, Zi-Hao Guo, Yi-Chien Lee, Rong-Ming Ho, Stephen Z.D. Cheng
Format: Article
Language:English
Published: Elsevier 2021-12-01
Series:Giant
Subjects:
Online Access:http://www.sciencedirect.com/science/article/pii/S2666542521000345