Influence of Deposition Temperature on Structure and Morphology of Nanostructured Sno2 Films Synthesized By Pulsed Laser Deposition (PLD)
Nanostructured Tin oxide thin films were deposited on the Si (111) substrate using pulsed laser deposition technique at different substrate temperatures (200, 300,400 and 500 °C) in an oxygen pressure (5*10-1 mbar). The structure and morphology of the as-deposited films indicate that the film crysta...
| Main Authors: | , |
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| Formato: | Artigo |
| Idioma: | English |
| Publicado: |
Unviversity of Technology- Iraq
2014-03-01
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| Series: | Engineering and Technology Journal |
| Subjects: | |
| Acceso en liña: | https://etj.uotechnology.edu.iq/article_102383_cc437670b7fb4b77838025224d9b67df.pdf |