Deposition behavior of TiB2 by microwave heating chemical vapor deposition (CVD)
Microwave heating chemical vapor deposition (CVD) is used to deposit titanium diboride (TiB2) films on graphite substrate using a gas mixture of TiCl4, BCl3, H2 and Ar. The influences of microwave power and the growth rate of TiB2 are studied by using X-ray diffraction, field emission scanning elect...
| Main Authors: | , , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
De Gruyter
2015-06-01
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| Series: | Green Processing and Synthesis |
| Subjects: | |
| Online Access: | https://doi.org/10.1515/gps-2015-0020 |