Hierarchical Self-Assembly of Thickness-Modulated Block Copolymer Thin Films for Controlling Nanodomain Orientations inside Bare Silicon Trenches

Hierarchical Self-Assembly of Thickness-Modulated Block Copolymer Thin Films for Controlling Nanodomain Orientations inside Bare Silicon Trenches

We study the orientation and ordering of nanodomains of a thickness-modulated lamellar block copolymer (BCP) thin film at each thickness region inside a topological nano/micropattern of bare silicon wafers without chemical pretreatments. With precise control of the thickness gradient of a BCP thin f...

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Bibliographic Details
Main Authors: Jin Yong Shin, Young Taek Oh, Simon Kim, Hoe Yeon Lim, Bom Lee, Young Chun Ko, Shin Park, Seung Won Seon, Se Gi Lee, Seung Soo Mun, Bong Hoon Kim
Format: Article
Language:English
Published: MDPI AG 2021-02-01
Series:Polymers
Subjects:
block copolymers
thickness gradient
directed self-assembly
graphoepitaxy
defect
nanolithography
Online Access:https://www.mdpi.com/2073-4360/13/4/553

Internet

https://www.mdpi.com/2073-4360/13/4/553

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