Electrochemically Deposited NiO Films as a Blocking Layer in <i>p</i>-Type Dye-Sensitized Solar Cells with an Impressive 45% Fill Factor

Electrochemically Deposited NiO Films as a Blocking Layer in <i>p</i>-Type Dye-Sensitized Solar Cells with an Impressive 45% Fill Factor

The enhancement of photoelectrochemical conversion efficiency of <i>p</i>-type dye-sensitized solar cells (<i>p</i>-DSSCs) is necessary to build up effective tandem devices in which both anode and cathode are photoactive. The efficiency of a <i>p</i>-type device (...

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Bibliographic Details
Main Authors: Matteo Bonomo, Diego Di Girolamo, Marco Piccinni, Denis P. Dowling, Danilo Dini
Format: Article
Language:English
Published: MDPI AG 2020-01-01
Series:Nanomaterials
Subjects:
blocking layer
electro-deposition
<i>p</i>-type dssc
recombination reactions
optimized fill factor
Online Access:https://www.mdpi.com/2079-4991/10/1/167

Internet

https://www.mdpi.com/2079-4991/10/1/167

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