Hardness, Modulus, and Refractive Index of Plasma-Assisted Atomic-Layer-Deposited Hafnium Oxide Thin Films Doped with Aluminum Oxide

Hardness, Modulus, and Refractive Index of Plasma-Assisted Atomic-Layer-Deposited Hafnium Oxide Thin Films Doped with Aluminum Oxide

Coatings with tunable refractive index and high mechanical resilience are useful in optical systems. In this work, thin films of HfO<sub>2</sub> doped with Al<sub>2</sub>O<sub>3</sub> were deposited on silicon at 300 °C by using plasma-enhanced atomic layer deposi...

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Bibliographic Details
Main Authors: Mikk Kull, Helle-Mai Piirsoo, Aivar Tarre, Hugo Mändar, Aile Tamm, Taivo Jõgiaas
Format: Article
Language:English
Published: MDPI AG 2023-05-01
Series:Nanomaterials
Subjects:
atomic layer deposition
thin film
mechanical properties
nanoindentation
hardness
modulus
Online Access:https://www.mdpi.com/2079-4991/13/10/1607

Internet

https://www.mdpi.com/2079-4991/13/10/1607

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