An introduction to lithography methods and providing a practical method for its optimization
In the first part of the present article, the important and main methods of photolithography are reviewed and discussed. Then we introduce the ways to improve the images created on the photoresist, which is the main material of lithography. Lithography with high-energy particle and soft lithography...
| Main Authors: | , |
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| Format: | Article |
| Language: | English |
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Isfahan University of Technology
2022-05-01
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| Series: | Iranian Journal of Physics Research |
| Subjects: | |
| Online Access: | https://ijpr.iut.ac.ir/article_1761_86d9864914e0e13e9d6c050a3b2d04a0.pdf |
| _version_ | 1828004227500212224 |
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| author | Arashmid Nahal Seyed Reza Hosseini |
| author_facet | Arashmid Nahal Seyed Reza Hosseini |
| author_sort | Arashmid Nahal |
| collection | DOAJ |
| description | In the first part of the present article, the important and main methods of photolithography are reviewed and discussed. Then we introduce the ways to improve the images created on the photoresist, which is the main material of lithography. Lithography with high-energy particle and soft lithography are then described. In the second part, the contact-photolithography method and its improvement process, which we use in our laboratory, are introduced and described in detail. We used this method for lithography to make diffraction optical elements on a glass substrate, doped by silver nanoparticles, using a helium ion beam. Light diffraction from the created lithography masks prevents access to very small images. To reduce the diffraction influence on the quality of the produced elements, we adapted and optimized the contact-lithography method for our project. Our solution, presented in this article, is practical and available for other researchers in Iran |
| first_indexed | 2024-04-10T07:11:36Z |
| format | Article |
| id | doaj.art-2a985bfbea424e81af92a5ebf645523a |
| institution | Directory Open Access Journal |
| issn | 1682-6957 2345-3664 |
| language | English |
| last_indexed | 2024-04-10T07:11:36Z |
| publishDate | 2022-05-01 |
| publisher | Isfahan University of Technology |
| record_format | Article |
| series | Iranian Journal of Physics Research |
| spelling | doaj.art-2a985bfbea424e81af92a5ebf645523a2023-02-26T10:34:25ZengIsfahan University of TechnologyIranian Journal of Physics Research1682-69572345-36642022-05-0122111410.47176/ijpr.22.1.312181761An introduction to lithography methods and providing a practical method for its optimizationArashmid Nahal0Seyed Reza Hosseini1Photonic Materials Research Laboratory, Department of Physics, College of Science, University of Tehran, Tehran, IranPhotonic Materials Research Laboratory, Department of Physics, College of Science, University of Tehran, Tehran, IranIn the first part of the present article, the important and main methods of photolithography are reviewed and discussed. Then we introduce the ways to improve the images created on the photoresist, which is the main material of lithography. Lithography with high-energy particle and soft lithography are then described. In the second part, the contact-photolithography method and its improvement process, which we use in our laboratory, are introduced and described in detail. We used this method for lithography to make diffraction optical elements on a glass substrate, doped by silver nanoparticles, using a helium ion beam. Light diffraction from the created lithography masks prevents access to very small images. To reduce the diffraction influence on the quality of the produced elements, we adapted and optimized the contact-lithography method for our project. Our solution, presented in this article, is practical and available for other researchers in Iranhttps://ijpr.iut.ac.ir/article_1761_86d9864914e0e13e9d6c050a3b2d04a0.pdflithographylight-sensitive materialsphotoresist |
| spellingShingle | Arashmid Nahal Seyed Reza Hosseini An introduction to lithography methods and providing a practical method for its optimization Iranian Journal of Physics Research lithography light-sensitive materials photoresist |
| title | An introduction to lithography methods and providing a practical method for its optimization |
| title_full | An introduction to lithography methods and providing a practical method for its optimization |
| title_fullStr | An introduction to lithography methods and providing a practical method for its optimization |
| title_full_unstemmed | An introduction to lithography methods and providing a practical method for its optimization |
| title_short | An introduction to lithography methods and providing a practical method for its optimization |
| title_sort | introduction to lithography methods and providing a practical method for its optimization |
| topic | lithography light-sensitive materials photoresist |
| url | https://ijpr.iut.ac.ir/article_1761_86d9864914e0e13e9d6c050a3b2d04a0.pdf |
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