Stoichiometry Dependence of Physical and Electrochemical Properties of the SnO<sub>x</sub> Film Anodes Deposited by Pulse DC Magnetron Sputtering

Stoichiometry Dependence of Physical and Electrochemical Properties of the SnO<sub>x</sub> Film Anodes Deposited by Pulse DC Magnetron Sputtering

A batch of Sn oxides was fabricated by pulse direct current reactive magnetron sputtering (pDC−RMS) using different Ar/O<sub>2</sub> flow ratios at 0.3 Pa; the influence of stoichiometry on the physical and electrochemical properties of the films was evaluated by the characterization of...

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Bibliographic Details
Main Authors: Yibo Ma, Xiaofeng Zhang, Weiming Liu, Youxiu Wei, Ziyi Fu, Jiuyong Li, Xuan Zhang, Jingjing Peng, Yue Yan
Format: Article
Language:English
Published: MDPI AG 2021-04-01
Series:Materials
Subjects:
tin oxide film
reactive magnetron sputtering
oxygen vacancy
cycle performance
Online Access:https://www.mdpi.com/1996-1944/14/7/1803

Internet

https://www.mdpi.com/1996-1944/14/7/1803

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