Noise Improvement of a-Si Microbolometers by the Post-Metal Annealing Process

Noise Improvement of a-Si Microbolometers by the Post-Metal Annealing Process

To realize high-resolution thermal images with high quality, it is essential to improve the noise characteristics of the widely adopted uncooled microbolometers. In this work, we applied the post-metal annealing (PMA) process under the condition of deuterium forming gas, at 10 atm and 300 °C for 30...

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Bibliographic Details
Main Authors: Jaesub Oh, Hyeong-sub Song, Jongcheol Park, Jong-Kwon Lee
Format: Article
Language:English
Published: MDPI AG 2021-10-01
Series:Sensors
Subjects:
microbolometer
amorphous Si
noise characteristic
metal annealing
deutrium
Online Access:https://www.mdpi.com/1424-8220/21/20/6722

Internet

https://www.mdpi.com/1424-8220/21/20/6722

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