Advanced unconventional techniques for sub‐100 nm nanopatterning

Advanced unconventional techniques for sub‐100 nm nanopatterning

Abstract Patterned nanostructures with ultrasmall features endow functional devices with unique nanoconfinement and performance enhancements. The increasing demand for miniaturization has stimulated the development of sub‐100 nm nanopatterning techniques. Beyond conventional lithography—which is lim...

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Bibliographic Details
Main Authors: Mengmeng Guo, Zhiyuan Qu, Fanyi Min, Zheng Li, Yali Qiao, Yanlin Song
Format: Article
Language:English
Published: Wiley 2022-08-01
Series:InfoMat
Subjects:
functional devices
high resolution
nanoconfinement
nanostructure
patterning techniques
sub‐100 nm
Online Access:https://doi.org/10.1002/inf2.12323

Internet

https://doi.org/10.1002/inf2.12323

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