Advanced unconventional techniques for sub‐100 nm nanopatterning
Abstract Patterned nanostructures with ultrasmall features endow functional devices with unique nanoconfinement and performance enhancements. The increasing demand for miniaturization has stimulated the development of sub‐100 nm nanopatterning techniques. Beyond conventional lithography—which is lim...
| Main Authors: | , , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
Wiley
2022-08-01
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| Series: | InfoMat |
| Subjects: | |
| Online Access: | https://doi.org/10.1002/inf2.12323 |
| _version_ | 1811308550536822784 |
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| author | Mengmeng Guo Zhiyuan Qu Fanyi Min Zheng Li Yali Qiao Yanlin Song |
| author_facet | Mengmeng Guo Zhiyuan Qu Fanyi Min Zheng Li Yali Qiao Yanlin Song |
| author_sort | Mengmeng Guo |
| collection | DOAJ |
| description | Abstract Patterned nanostructures with ultrasmall features endow functional devices with unique nanoconfinement and performance enhancements. The increasing demand for miniaturization has stimulated the development of sub‐100 nm nanopatterning techniques. Beyond conventional lithography—which is limited by unavoidable factors—advanced patterning techniques have been reported to produce nanoscale features down to molecular or even atomic scale. In this review, unconventional techniques for sub‐100 nm nanopatterning are discussed, in particular the principles by which to achieve the desired patterns (among other important issues). Such techniques can be classified into three categories: template‐replica, template‐induced, and template‐free techniques. Moreover, multi‐dimensional nanostructures consist of various building materials, the unique properties of which are summarized. Finally, the remaining challenges and opportunities for large‐scale patterning, the improvement of device performance, the multi‐dimensional nanostructures of biocompatible materials, molecular‐scale patterning, and the carbon footprint requirements for future nanofabrication processes are discussed. |
| first_indexed | 2024-04-13T09:25:13Z |
| format | Article |
| id | doaj.art-2bf789cc5e504ab8a97251e84e20c607 |
| institution | Directory Open Access Journal |
| issn | 2567-3165 |
| language | English |
| last_indexed | 2024-04-13T09:25:13Z |
| publishDate | 2022-08-01 |
| publisher | Wiley |
| record_format | Article |
| series | InfoMat |
| spelling | doaj.art-2bf789cc5e504ab8a97251e84e20c6072022-12-22T02:52:28ZengWileyInfoMat2567-31652022-08-0148n/an/a10.1002/inf2.12323Advanced unconventional techniques for sub‐100 nm nanopatterningMengmeng Guo0Zhiyuan Qu1Fanyi Min2Zheng Li3Yali Qiao4Yanlin Song5Key Laboratory of Green Printing Institute of Chemistry, Chinese Academy of Sciences (ICCAS) Beijing PR ChinaKey Laboratory of Green Printing Institute of Chemistry, Chinese Academy of Sciences (ICCAS) Beijing PR ChinaKey Laboratory of Green Printing Institute of Chemistry, Chinese Academy of Sciences (ICCAS) Beijing PR ChinaState Key Laboratory of Trauma, Burn and Combined Injury Institute of Burn Research, Southwest Hospital, Army Medical University Chongqing PR ChinaKey Laboratory of Green Printing Institute of Chemistry, Chinese Academy of Sciences (ICCAS) Beijing PR ChinaKey Laboratory of Green Printing Institute of Chemistry, Chinese Academy of Sciences (ICCAS) Beijing PR ChinaAbstract Patterned nanostructures with ultrasmall features endow functional devices with unique nanoconfinement and performance enhancements. The increasing demand for miniaturization has stimulated the development of sub‐100 nm nanopatterning techniques. Beyond conventional lithography—which is limited by unavoidable factors—advanced patterning techniques have been reported to produce nanoscale features down to molecular or even atomic scale. In this review, unconventional techniques for sub‐100 nm nanopatterning are discussed, in particular the principles by which to achieve the desired patterns (among other important issues). Such techniques can be classified into three categories: template‐replica, template‐induced, and template‐free techniques. Moreover, multi‐dimensional nanostructures consist of various building materials, the unique properties of which are summarized. Finally, the remaining challenges and opportunities for large‐scale patterning, the improvement of device performance, the multi‐dimensional nanostructures of biocompatible materials, molecular‐scale patterning, and the carbon footprint requirements for future nanofabrication processes are discussed.https://doi.org/10.1002/inf2.12323functional deviceshigh resolutionnanoconfinementnanostructurepatterning techniquessub‐100 nm |
| spellingShingle | Mengmeng Guo Zhiyuan Qu Fanyi Min Zheng Li Yali Qiao Yanlin Song Advanced unconventional techniques for sub‐100 nm nanopatterning InfoMat functional devices high resolution nanoconfinement nanostructure patterning techniques sub‐100 nm |
| title | Advanced unconventional techniques for sub‐100 nm nanopatterning |
| title_full | Advanced unconventional techniques for sub‐100 nm nanopatterning |
| title_fullStr | Advanced unconventional techniques for sub‐100 nm nanopatterning |
| title_full_unstemmed | Advanced unconventional techniques for sub‐100 nm nanopatterning |
| title_short | Advanced unconventional techniques for sub‐100 nm nanopatterning |
| title_sort | advanced unconventional techniques for sub 100 nm nanopatterning |
| topic | functional devices high resolution nanoconfinement nanostructure patterning techniques sub‐100 nm |
| url | https://doi.org/10.1002/inf2.12323 |
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