Advanced unconventional techniques for sub‐100 nm nanopatterning
Abstract Patterned nanostructures with ultrasmall features endow functional devices with unique nanoconfinement and performance enhancements. The increasing demand for miniaturization has stimulated the development of sub‐100 nm nanopatterning techniques. Beyond conventional lithography—which is lim...
Main Authors: | , , , , , |
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Format: | Article |
Language: | English |
Published: |
Wiley
2022-08-01
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Series: | InfoMat |
Subjects: | |
Online Access: | https://doi.org/10.1002/inf2.12323 |