Experimental Investigation on the Sputtering Process for Tantalum Oxynitride Thin Films
Metal oxynitrides are compounds between nitrides and oxides with a certain level of photocatalytic functions. The purpose of this study is to investigate an appropriate range of oxygen flow rate during sputtering for depositing tantalum oxynitride films. The sputtering process was carried out under...
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| Format: | Artikel |
| Sprache: | English |
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MDPI AG
2021-02-01
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| Schriftenreihe: | Photonics |
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| Online Zugang: | https://www.mdpi.com/2304-6732/8/2/53 |