Rapid thermal annealing of sputter-deposited ZnO:Al films for microcrystalline Si thin-film solar cells
Rapid thermal annealing of sputter-deposited ZnO and Al-doped ZnO (AZO) films with and without an amorphous silicon (a-Si) capping layer was investigated using a radio-frequency (rf) argon thermal plasma jet of argon at atmospheric pressure. The resistivity of bare ZnO films on glass decreased from...
| Main Authors: | , , , , , , |
|---|---|
| Format: | Article |
| Language: | English |
| Published: |
EDP Sciences
2012-01-01
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| Series: | EPJ Photovoltaics |
| Online Access: | https://www.epj-pv.org/articles/epjpv/full_html/2012/01/pv110009/pv110009.html |