Combining Interference Lithography and Two-Photon Lithography for Fabricating Large-Area Photonic Crystal Structures with Controlled Defects
Interference lithography is a promising method for fabricating large-area, defect-free three-dimensional photonic crystal structures which can be used for facilitating the realization of photonic devices with a fast processing time. Although they can be used in waveguides, resonators, and detectors,...
| Main Authors: | , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
MDPI AG
2021-07-01
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| Series: | Applied Sciences |
| Subjects: | |
| Online Access: | https://www.mdpi.com/2076-3417/11/14/6559 |