Analysis of low-temperature CVD growth process of diamond films in C-H-F atmosphere

Analysis of low-temperature CVD growth process of diamond films in C-H-F atmosphere

To better understand the growth mechanism of diamond films via low-temperature chemical vapor deposition in a C-H-F atmosphere, this paper employed density functional theory based on first principle. It calculated the adsorption energy, reaction heat, and reaction energy barrier of H and F atoms und...

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Bibliographic Details
Main Authors: Xiaogang JIAN, Xiaowei LIANG, Wenshan YAO, Yi ZHANG, Binhua ZHANG, Zhe CHEN, Maolin CHEN
Format: Article
Language:zho
Published: Zhengzhou Research Institute for Abrasives & Grinding Co., Ltd. 2024-02-01
Series:Jin'gangshi yu moliao moju gongcheng
Subjects:
cvd diamond film
fluorine
deposition mechanism
first-principles
adsorption
surface chemical reaction
Online Access:http://www.jgszz.cn/article/doi/10.13394/j.cnki.jgszz.2023.0069

Internet

http://www.jgszz.cn/article/doi/10.13394/j.cnki.jgszz.2023.0069

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