Formation of silicon layer through aluminothermic reduction of quartz substrates
Silicon (Si) films were obtained through aluminothermic reduction of the quartz (SiO2) substrates, where the surface of the quartz in contact with the deposited aluminum (Al) layer has been converted to film Si during high-temperature annealing following reduction reaction. X-ray diffraction (XRD) p...
| Main Authors: | , , , |
|---|---|
| Format: | Article |
| Language: | English |
| Published: |
Frontiers Media S.A.
2022-09-01
|
| Series: | Frontiers in Materials |
| Subjects: | |
| Online Access: | https://www.frontiersin.org/articles/10.3389/fmats.2022.977869/full |